加利福尼亚州圣地亚哥

EUV light source technology

The team at ASML San Diego designs, develops and qualifies the EUV (extreme ultraviolet) light source, as well as manufactures a critical system component called the droplet generator (DG). The droplet generator is the heartbeat of the source, delivering a steady stream of 50,000 liquid tin droplets per second, which fly at more than 241 kilometers per hour in a vacuum vessel. The size, spacing and frequency of the droplets all impact the amount of EUV light produced.

Each droplet – whose size is a fraction of the thickness of a human hair – is individually imaged and targeted by two high-power CO₂激光脉冲，产生发出EUV光的等离子体。高度抛光的多层镜收集并反映了13.5纳米的EUV光，并将其指向扫描仪的精确出口点。

这需要一个名副其实的激光，相机和其他传感器（统称称为船只计量学）的乐团，以确保对EUV生成的稳定等离子体的创建，优化和调节。ASML圣地亚哥工程师必须确定激光器靶向液滴以生成等离子体的最佳点，需要极高的精度和同步。所得的EUV光输出必须满足扫描仪的精确能量轮廓要求，以使每个模具都被晶圆上的EUV光均匀暴露。

TIN管理也是EUV源中一个独特而具有挑战性的问题，因为材料既是必要又有问题：创建光源是必需的，但是它可能会污染光学元件。ASML圣地亚哥专注于研究和开发有效的机制，以捕获和去除锡从容器中，以及将锡从系统中运出系统。